CNC Processed Silicon Dioxide Sputtering Target Fine Grinding Surface
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Silicon Dioxide Sputtering Target With Fine Grinding Surface Processed By CNC Quartz glass SiO2 also called silica glass is a very important material for industry and research. Quartz glass, which has a low coefficient of thermal expansion similar to ......
Yantai ZK Optics Co., Ltd.
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Silicon Dioxide granule 0.5-3mm,1-3mm,2-4mm,3~5mm ; Φ2x2mm ; Φ3x3mm; Φ25 or customer requirement size (SiO2 granule)
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SiO2 granule 0.5-3mm 1-3mm 2-4mm or customization 99.99% Chemical name: SiO2 Boiling point: 2230℃ Purity: 4N Specification: 1-4mm, particle, target Molecular weight: 60.08 Appearance: white Melting point: 1700℃ Density: 2.2-2.7g/cm3 In 10-4Torr vacuum ......
Chongqing Newsin Technology Co., Ltd
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Fine Uniform Thickness Film 3C Electronic Components Vacuum PVD Magnetron Sputtering Coating Equipment
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Working Principle: Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-......
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
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Single Tube Vibrating Ball Mill Powder Processing Machine For Aluminum Oxide
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... Oxide / Silicon Dioxide Product Description ZM series single - tube vibration mill is a new type of high efficient energy saving powder grinding equipment. It has obvious advantages over traditional rotary mill tools when grinding fine powder and ......
Xinxiang Yihu Machinery Equipment Co.,Ltd
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