Sputtering Tungsten Targets Close Grain For LCD Panel
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Sputtering Tungsten Targets Close Grain For LCD Panel 1. Product Details: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than 20ppm It's widely used in aerospace industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can also bonding the target...
Fonlink Photoelectric (Luoyang) Co., ltd
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High Purity 99.97% Tungsten Target Ground Surface Condition For Sputtering Coating
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... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been...
Luoyang Hypersolid Metal Tech Co., Ltd
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock
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Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets......
Shaanxi Peakrise Metal Co.,Ltd
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Ta Sputtering Titanium Target Sheet 99.95% Purity Semiconductor Optical Coatings
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... target, thickness x width x length = 5 ～ 25x≤800x≤2000 (mm) Grain size: Recrystallization degree ≥98%, average grain size <100μm, uniform grain distribution, no delamination. According to the special requirements of users, the grain size> 100μm...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Vacuum Coating Titanium Gr1 Sputtering Tube Targets 133OD*125ID*840L
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...Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840L Vacuum Coating Target Sputtering Item name Titanium tube target Size φ133*φ125*840 Grade Gr1 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Materials technology development trend of the target material is closely......
Baoji Feiteng Metal Materials Co., Ltd.
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Closed Grain Dust Free Bag Unloading Station Big Bag Unloader For Metal Powder
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Closed Grain Dust-Free Bag Unloading Station Big Bag Unloader For Metal Powder Product Introduction Big Bag Unloader is a device specially designed to unload large bagged materials (such as ton bags, large bags, and container bags) efficiently and conveniently. Its main function is to safely and quickly transfer materials in large bags to the target......
EVERSUN Machinery (Henan) Co., Ltd
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Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
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Tungsten Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target is an important substrate for the tungsten......
JINXING MATECH CO LTD
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High Purity Tungsten Metal Alloy Tungsten Sputtering Target GB/T19001 Approved
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...tungsten target product for sales high temperature resistance Product Description High quality tungsten target product for sales Properties Target weight:≤200kg/pc, Purity:≥99.95%. Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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PVD Arc Ion Molybdenum Tungsten Alloy Plate Target For Magnetron Sputtering Coating
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Tungsten-Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition technologies. Below I will give you a detailed introduction to the specifications, technical parameters and uses of tungsten......
Shaanxi Peakrise Metal Co.,Ltd
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